Contamination Control/NANO Conference Sessions

Conference sessions are comprised of technical papers, panels, and case studies on the latest issues that the industry is experiencing. Get the most up-to-date information from leading industry experts in your fields.


Sessions are subject to change and will be updated as presentations are finalized and added to the program line-up.


Tuesday, April 30, 2019

8 - 9:50 a.m.
New Practices in Cleanroom Contamination Control
Chair: Wei Sun, Engsysco, Inc.

This seminar will address multiple fields of some newly emerged technologies and practices in cleanroom contamination control. Cleanrooms often are equipped with Fan Filter Units (FFU) on ceiling to maintain cleanrooms’ air cleanliness ISO classes to meet process specifications. Two speakers will discuss about the trends with focus on energy management, FFU’s motor control modes either by constant flow, constant torque or constant speed. Besides the speakers will present the typical FFU control approaches such as stand-alone PLC control, analogy DDC, Modbus and BACnet, and further the BAS, BMS, industrial Internet of Things (IoT) for Smart Buildings. Discussions will be further extended into adding additional sensors to provide a measured airflow/pressure drop data in order to both accurately and cost-effectively monitor FFU airflow, the successful optimization of cleanroom airflow can be implemented to regulate the cleanroom environment in an energy efficient manner. Another presentation will focus more on cleanroom airflow feedback control system which is based on real-time particle sensing either through a group of laser particle sensors or a group of multiple sequential/manifold sampling tubes in the cleanroom. The system’s particle sensing speed and fan speed (AHU or FFU) reaction time interval can be adjusted through computer software to achieve an optimized combination based on a cleanroom’s ISO class and HVAC system, the system can also indicate real-time “Air Change Rate vs. Average Room Particle Concentration” on control screen to illustrate the impact of airflow rate on room’s cleanliness class as a part of cleanroom BMS integration. For semiconductor manufacturing, contamination risk from Electro Magnetic Interference (EMI) becomes much more significant due to the increasing levels of power demand for process tools, decreasing structures and widespread applications of electron optical processes in metrology tools, EMI can disturb or damage sensitive electron-optical process tools. The speaker will present the impacts of magnetic fields, address the latest requirements of process technology, process tools and ITRS, and present the results of an EMI sensitivity analysis of existing semiconductor fabs, inform the audience about the relevant sources of magnetic fields in high-tech fabs and outline the measures and procedures to control these fields.

  • Practices to Improve FFU Performance and Control -- Les Goldsmith, Envirco
  • Cleanroom Airflow Demand Feedback Control Based on Real-time Particle Sensing -- Wei Sun, Engsysco, Inc.
  • Electro Magnetic Interference (EMI) – An Emerging Contamination Risk for Semiconductor Manufacturing -- Wolfgang Eißler, Exyte Technology GmbH
  • Improvements in Air-Flow Management Using Fan Filter Units – Describing New Techniques for Monitoring and Controlling CFM in Cleanroom Applications -- Howard Abramowitz, AirCare Automation, Inc.


10:10 a.m. - 12 p.m.
Chair: Ahmad Soueid, HDR Architecture, Inc.

  • Vibration Monitoring and Certification for Cleanroom Environments -- Ethan Brush, ACENTECH
  • Active Compensation Systems (ACS) Industry Overview & Critical Performance Parameters — Lou Vitale and Drew McCrady, VITATECH
  • Delivering Better Tool Vibration Criteria Using New Techniques from IEST-RP-NANO-207 — Byron Davis, Vibrasure

1:15 - 3:05 p.m.
Cleanroom Risk Assessment Deep Dive
Presenter: Anne Marie Dixon, Cleanroom Management Associates, Inc.

This deep-dive session will address why risk assessments for cleanrooms are failing and the root causes are rarely found. Several case studies will be reviewed using different risk assessment methods.

3:25 - 5:15 p.m.
Contamination Control Challenges
Chair: Ziva Abraham, Microrite

  • Particulate and Microbial Contamination: Case Studies and Resolutions -- Ziva Abraham, Microrite
  • Manufacturing Environment Control for Sterile Medical Devices -- Doug Harbrecht, Sterility Assurance, LLC
  • Cleaning Challenges in Various Industries -- Mike Mendoza, Controlled Contamination Services

Wednesday, May 1, 2019

8 - 9:50 a.m.
Pharmaceutical Microbiology
Chair: Jim Polarine, STERIS

  • Investigation Strategies for Microbial Contamination Events: A Risk and Science Based Approach -- Joseph McCall, STERIS
  • Case Studies in Fungal and Bacterial Spore Excursions in Cleanrooms — Jim Polarine, STERIS
  • Pharmaceutical Microbiology: Understanding the Challenges — Ziva Abraham, Microrite

10:10 a.m. - 12 p.m.
Testing and Certification Documents
Chair: Rick Meyer, Superior Laboratory Services, Inc.
Co-Chair: Robert Giroux,
Certifab, Inc

  • Quality Improvement using IEST CC Recommended Practices -- Robert Giroux, Certifab, Inc.
  • Integrated VPHP Decontamination Systems: The Emerging Utility — John Klostermyer, STERIS
  • Biosafety Cabinets Class, Types, and Basic Certification — Ruben Contreras, Superior Laboratory Services, Inc.

3:25 - 5:15 p.m.
Industrial Hygiene - A Different Take on Environmental Testing and Contamination Control Deep Dive

The members of the Institute of Environmental Sciences and Technology (IEST) appear to mostly be interested in Product and Equipment Protection while industrial hygienists are mostly interested in Human Worker and Community Protection. The main differences seem to center around the definitions of “Environmental” Testing and “Contamination” Control. Some of the topics the IEST appears to address include: 1) vibration testing; 2) cleanroom testing; 3) microbial contamination in
cleanrooms; 4) personal protective equipment for cleanrooms; 5) FDA compliance for cleanrooms; 6) nanotechnology, 7) cleaning technologies; 8) semi-conductor manufacture; 9) product reliability; 10) temperature measurement effects on equipment; and 11) USP 800 design. Mr. Dale Walsh, a Certified Industrial Hygienist with a MS in Toxicology and Industrial Hygiene and 32 years of IH consulting experience, will provide a presentation on the basics of industrial hygiene and
how each of the eleven issues described above is addressed in the field of industrial hygiene, as applicable. One of the main outcomes of this presentation is to show those members of the IEST how another industry addresses these issues and how some of the concepts in industrial hygiene may be applied to product and equipment protection.


Thursday, May 2, 2019

8 - 9:50 a.m.
Emerging Markets
Chair: Jim Polarine, STERIS

  • The Use of Clean Room Technology and Practices in the Cannabis Industry — Peter Maguire, Lighthouse Worldwide Solutions
  • Cannabis: Keeping it Clean – Beth Kroeger-Fahnestock, STERIS
  • Environmental Monitoring System (EMS) Designs and Risk Mitigation — Jason Kelly, Lighthouse Worldwide Solutions

10:10 a.m. - 12 p.m.

Controlled Environment Garments, Gloves, Wipers, and Seating
Chair: Greg Heiland, Valutek

  • Cleanrooms and Hazardous Drugs: Selecting Garments at the Intersection — Jennifer Galvin, DuPont Safety and Construction
  • Demystifying the Process of Specifying Technical Seating for Clean Room and ESD Environments — Brian Schultz, Biofit Engineered Products
  • How Consumables are Selected and Requirements’ Availability: Consumer’s Point of View — Taguhi Arakelian, Jet Propulsion Laboratory
  • Highlights of the New Wiper Evaluation RP, IEST-RP-CC004.4 — Jay Postlewaite, Texwipe

1:15 - 3:05 p.m.
Airborne Molecular Contamination (AMC) in the Cleanroom
Chair: Victor Chia, Balazs NanoAnalysis - Air Liquide
Airborne molecular contamination (AMC) is a significant contributor to the loss of yield in semiconductor processes and affects many other industries, such as optical, medical, aerospace and defense. The impact of AMC becomes prominent when AMC forms surface molecular contamination (SMC) on critical components. This session invites contributions to how AMC is formed, and how we can control, monitor and reduce AMC and SMC. AMC is a common contamination that affects all of us. We welcome you to share best practices in a cleanroom and during activities. Join this session to meet colleagues who encounter the same challenges as you and expand your contamination control network.

  • Ultrasonic and Megasonic Cleaning: State-of-the-Art Systems and Processes -- Dr. Ramamurthy Nagarajan, IIT Madras and Vetrimurugan Rajagopal, Crest Ultrasonics.
  • NASA’s Astromaterials Research and Exploration Science (ARES) Division Cleanroom AMC Monitoring – Aurore Hutzler, USRA Lunar and Planetary Institute/NASA’s Astromaterials Research and Exploration Science (ARES) Division
  • MIL-STD-1246D Standard for Non-Volatile Residue and Thermal Desorption GC-MS for Cleanroom Monitoring — Victor Chia, Balazs NanoAnalysis - Air Liquide