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8:00 – 10:00 a.m.
Recent Research in Cleanroom Design, Airliner Cabins, and Microbial Filtration
Chair: Wei Sun
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Presentations will cover transmission of airborne contaminants in airliner cabins, experimental and model research on the survival and reentrainment of airborne microbes on fibrous ventilation filters, and cleanroom airflow rate modeling and fan energy conservation strategies.
10:15 a.m. – 12:15 p.m.
Upcoming Revisions to IEST-RP-CC006, Testing Cleanrooms
Chair: Robert Mielke
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This session will give a brief overview of IEST-RP-CC006, Testing Cleanrooms, and then will go into detail on topics that will be added to the next revision of the document. Two topics that will be covered are a new cleanroom visualization test and a new cleanroom decay test.
1:00 – 3:00 p.m.
Filter and Cleanroom Testing and Validation
Chair: Andy Stillo
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This seminar will cover specific aspects of HEPA filter and cleanroom testing and present topics on current testing and validation practices.
3:15 – 5:15 p.m.
What is Happening with the ISO Cleanroom Standards, the ISO 14644 Series and the ISO 14698 Series
Chair: Anne Marie Dixon
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This session will give a brief overview of ISO Technical Committee 209, followed by a discussion of the progress of three TC 209 Working Groups (WGs): WG 1, which is finalizing new DIS versions of ISO 14644-1 and ISO 14644-2; WG 2, Biocontamination; and WG 10, Nanotechnology.
WEDNESDAY, MAY 5, 2010
8:00 – 10:00 a.m.
Contamination Control Practices in China
Chair: Junjie Liu
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In conjunction with a dramatic increase in China’s cleanroom market in the past decade, many of the country’s guidelines and national standards for cleanroom design and cleanroom products have been upgraded. This seminar will introduce the newest design guidelines and practices for hospital operating rooms in China, as well as performance standards for testing HEPA filters, general ventilation filters, and fan-filter units. The seminar will inform attendees about the technical level of cleanrooms in China and possible opportunities for cooperation in research and product development.
10:15 a.m. – 12:15 p.m.
Nanotechnology: Part One
Chair: Ahmad Soueid
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Nanotechnology encompasses nanoscale materials, their effects, their production, and the design and operation of their facilities. This session will present papers on current work and practices as well as standards that cover all aspects of nanotechnology. Several leaders in nanotechnology will present their perspectives and discuss IEST’s focus in this new discipline.
1:30 – 3:00 p.m.
Nanotechnology: Part Two
Chair: Ahmad Soueid
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This seminar is a continuation of Nanotechnology: Part One.
3:15 – 5:15 p.m.
Advances in Filtration Media
Chair: Donna Kasper
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Filter media is the key component of any filter. Several new materials are now available for many applications. This session will present papers on the current trends in filter media and their test methods.
THURSDAY, MAY 6, 2010
8:00 – 10:00 a.m.
Review of Recently Updated Contamination Control Recommended Practices
Chair: Gary Knoth
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IEST has published two new and four revised versions of Contamination Control Recommended Practices in the past 12 months. Four RPs on filters have been revised to reflect current actual practices. Representatives of the Working Groups that developed these documents will summarize the highlights.
10:15 a.m. – 12:15 p.m.
Airborne Contamination and Migration in Controlled Environments
Chair: Mark Camenzind
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Particles, molecules, and other contaminants can come from internal or external sources and cross-contaminate areas sharing airflow or equipment. The control of sources and understanding airflows locally and globally can help design fabs so that cross-contamination risks are reduced, and can help plan modifications of existing fabs to handle steady-state or episodic contamination, through use of airflow, pressurization, and cost effective location of AMC or particle filters.
1:00 – 3:00 p.m.
Cleanroom Garments and Consumables
Chair: Troy Ohmes
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Employees are the most significant source of risk to the integrity of the cleanroom. This course will study the materials systems and protocols required to control this source of contamination and maintain the required cleanliness levels.
